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Process of opto-mechanical design and assembly for reflective mirror subsystem of lithographic projection lens

  • Wei Cheng Lin
  • , Shenq Tsong Chang
  • , Chien Kai Chung
  • , Yu Chuan Lin
  • , Shih Feng Tseng

研究成果: 書籍/報告/會議論文中的章節會議投稿同行評審

3 引文 斯高帕斯(Scopus)

摘要

Considering the system performance of the projection lens, not only surface quality of the optics shall be concerned, misalignment between each optics and the wavefront distortion contributed by the mounting stress and gravity are also the factors degraded the optical performance. This article introduces the opto-mechanical design and stress-free assembly process of the reflective mirror subsystem with 300 mm in outer diameter of an I-line lithographic projection lens. The flexure with mounting position pass through the center gravity of the mirror can be adopted as supporting mechanism to prevent the gravity distortion. The distortion due to temperature difference can be avoided by adopting CLERACREAM® -Z glass ceramic and INVAR for material of reflective mirror and supporting flexure respectively. The adjustment mechanism of the mirror subsystem integrates the concepts of Kinematic and exact constraint to provide six degrees of freedom (6DoF) of posture adjustment of the mirror. Furthermore, the assembly process of the flexure which minimizes the mounting stress on the mirror is presented. In the end of this article, interferometric performance test of the reflective mirror after opto-mechanical assembly compared with the measurement result in manufacturing stage is also presented. With the proposed opto-mechanical design and stress-free mounting process of the mirror, the surface distortion contributed by the amount of mounting stress and gravity effect is less than P-V 0.02 wave @632.8 nm.

原文English
主出版物標題Optical Microlithography XXX
編輯Andreas Erdmann, Jongwook Kye
發行者SPIE
ISBN(電子)9781510607453
DOIs
出版狀態Published - 2017
事件Optical Microlithography XXX 2017 - San Jose, United States
持續時間: 28 2月 20172 3月 2017

出版系列

名字Proceedings of SPIE - The International Society for Optical Engineering
10147
ISSN(列印)0277-786X
ISSN(電子)1996-756X

Conference

ConferenceOptical Microlithography XXX 2017
國家/地區United States
城市San Jose
期間28/02/172/03/17

文獻附註

Publisher Copyright:
© 2017 SPIE.

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