摘要
Robots are widely used as unmanned vehicles in smart factories. In order to operate the robot in a known environment, the robot must be able to plan the path. The planned path must enable the robot to reach a destination from the starting point and the robot must avoid all obstacles during movement.This study uses a four-parameter logic curve path planning method that uses a closed formula solution and a curve with minimal design parameters to quickly generate an ideal path. The characteristics of the curve are used to derive the S and half-S curves as the solution path. The shortest path is used as the selection reference target to select parameters B and C for the four-parameter logic curve. For the S path, the best solution is chosen. The half -S curve is limited by the elastic end-point heading angle, which gives a unique set of parameter solutions. The generated path does not allow the robot to completely avoid obstacles so a hierarchical half-S curve path planning mechanism is used. A via point is generated at the collision point using the gradient vector for the edge of the obstacle. The planner continues to perform half-S path planning until the path planning ends.
| 原文 | English |
|---|---|
| 主出版物標題 | 2020 IEEE International Conference on Systems, Man, and Cybernetics, SMC 2020 |
| 發行者 | Institute of Electrical and Electronics Engineers Inc. |
| 頁面 | 3358-3363 |
| 頁數 | 6 |
| ISBN(電子) | 9781728185262 |
| DOIs | |
| 出版狀態 | Published - 11 10月 2020 |
| 事件 | 2020 IEEE International Conference on Systems, Man, and Cybernetics, SMC 2020 - Toronto, Canada 持續時間: 11 10月 2020 → 14 10月 2020 |
出版系列
| 名字 | Conference Proceedings - IEEE International Conference on Systems, Man and Cybernetics |
|---|---|
| 卷 | 2020-October |
| ISSN(列印) | 1062-922X |
Conference
| Conference | 2020 IEEE International Conference on Systems, Man, and Cybernetics, SMC 2020 |
|---|---|
| 國家/地區 | Canada |
| 城市 | Toronto |
| 期間 | 11/10/20 → 14/10/20 |
文獻附註
Publisher Copyright:© 2020 IEEE.
指紋
深入研究「Path Planning for Continuous-curvature Avoidance using Hierarchical Four Parameter Logistic Curves」主題。共同形成了獨特的指紋。引用此
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver