摘要
We have designed and fabricated a high-reflectivity AlAs/GaAs distributed Bragg reflector (DBR) at 1.3 μm. By transplanting the InP/InGaAs/InP heterojunction epitaxial film to an AlAs/GaAs DBR, which is grown on the GaAs substrate, the epitaxial lift-off (ELO) photodiode exhibits a low dark current of 4.4 nA at a reverse bias of 0.5 V. This demonstrates the feasibility to fabricate a good performance of InGaAs/DBR resonant-cavity-enhanced photodetectors by ELO technique.
| 原文 | English |
|---|---|
| 頁(從 - 到) | 1763-1767 |
| 頁數 | 5 |
| 期刊 | Solid-State Electronics |
| 卷 | 47 |
| 發行號 | 10 |
| DOIs | |
| 出版狀態 | Published - 10月 2003 |
文獻附註
Funding Information:The financial support from National Science Council (NSC 91-2215-E-007-013) and Photonic Technology Research, Telecommunication Laboratories, Chunghwa Telecom Company, Ltd., is appreciated.
指紋
深入研究「Investigation of epitaxial lift-off the InGaAs p-i-n photodiodes to the AlAs/GaAs distributed Bragg reflectors」主題。共同形成了獨特的指紋。引用此
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