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Investigation of epitaxial lift-off the InGaAs p-i-n photodiodes to the AlAs/GaAs distributed Bragg reflectors

  • Chi Da Yang
  • , Chong Long Ho
  • , Ming Yuan Wu
  • , Juh Yuh Su
  • , Wen Jeng Ho
  • , Meng Chyi Wu

研究成果: 期刊貢獻文章同行評審

8 引文 斯高帕斯(Scopus)

摘要

We have designed and fabricated a high-reflectivity AlAs/GaAs distributed Bragg reflector (DBR) at 1.3 μm. By transplanting the InP/InGaAs/InP heterojunction epitaxial film to an AlAs/GaAs DBR, which is grown on the GaAs substrate, the epitaxial lift-off (ELO) photodiode exhibits a low dark current of 4.4 nA at a reverse bias of 0.5 V. This demonstrates the feasibility to fabricate a good performance of InGaAs/DBR resonant-cavity-enhanced photodetectors by ELO technique.

原文English
頁(從 - 到)1763-1767
頁數5
期刊Solid-State Electronics
47
發行號10
DOIs
出版狀態Published - 10月 2003

文獻附註

Funding Information:
The financial support from National Science Council (NSC 91-2215-E-007-013) and Photonic Technology Research, Telecommunication Laboratories, Chunghwa Telecom Company, Ltd., is appreciated.

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