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Process of opto-mechanical design and assembly for reflective mirror subsystem of lithographic projection lens

  • Wei Cheng Lin
  • , Shenq Tsong Chang
  • , Chien Kai Chung
  • , Yu Chuan Lin
  • , Shih Feng Tseng

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

3 Scopus citations

Abstract

Considering the system performance of the projection lens, not only surface quality of the optics shall be concerned, misalignment between each optics and the wavefront distortion contributed by the mounting stress and gravity are also the factors degraded the optical performance. This article introduces the opto-mechanical design and stress-free assembly process of the reflective mirror subsystem with 300 mm in outer diameter of an I-line lithographic projection lens. The flexure with mounting position pass through the center gravity of the mirror can be adopted as supporting mechanism to prevent the gravity distortion. The distortion due to temperature difference can be avoided by adopting CLERACREAM® -Z glass ceramic and INVAR for material of reflective mirror and supporting flexure respectively. The adjustment mechanism of the mirror subsystem integrates the concepts of Kinematic and exact constraint to provide six degrees of freedom (6DoF) of posture adjustment of the mirror. Furthermore, the assembly process of the flexure which minimizes the mounting stress on the mirror is presented. In the end of this article, interferometric performance test of the reflective mirror after opto-mechanical assembly compared with the measurement result in manufacturing stage is also presented. With the proposed opto-mechanical design and stress-free mounting process of the mirror, the surface distortion contributed by the amount of mounting stress and gravity effect is less than P-V 0.02 wave @632.8 nm.

Original languageEnglish
Title of host publicationOptical Microlithography XXX
EditorsAndreas Erdmann, Jongwook Kye
PublisherSPIE
ISBN (Electronic)9781510607453
DOIs
StatePublished - 2017
EventOptical Microlithography XXX 2017 - San Jose, United States
Duration: 28 Feb 20172 Mar 2017

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume10147
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceOptical Microlithography XXX 2017
Country/TerritoryUnited States
CitySan Jose
Period28/02/172/03/17

Bibliographical note

Publisher Copyright:
© 2017 SPIE.

Keywords

  • Gravity effect
  • Lithographic projection lens
  • Mounting stress
  • Opto-mechanical assembly
  • Wavefront distortion

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