Abstract
We have designed and fabricated a high-reflectivity AlAs/GaAs distributed Bragg reflector (DBR) at 1.3 μm. By transplanting the InP/InGaAs/InP heterojunction epitaxial film to an AlAs/GaAs DBR, which is grown on the GaAs substrate, the epitaxial lift-off (ELO) photodiode exhibits a low dark current of 4.4 nA at a reverse bias of 0.5 V. This demonstrates the feasibility to fabricate a good performance of InGaAs/DBR resonant-cavity-enhanced photodetectors by ELO technique.
| Original language | English |
|---|---|
| Pages (from-to) | 1763-1767 |
| Number of pages | 5 |
| Journal | Solid-State Electronics |
| Volume | 47 |
| Issue number | 10 |
| DOIs | |
| State | Published - Oct 2003 |
Bibliographical note
Funding Information:The financial support from National Science Council (NSC 91-2215-E-007-013) and Photonic Technology Research, Telecommunication Laboratories, Chunghwa Telecom Company, Ltd., is appreciated.
Keywords
- Distributed bragg reflector (DBR)
- Epitaxial lift-off (ELO)
- InGaAs p-i-n photodiode
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