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Investigation of epitaxial lift-off the InGaAs p-i-n photodiodes to the AlAs/GaAs distributed Bragg reflectors

  • Chi Da Yang
  • , Chong Long Ho
  • , Ming Yuan Wu
  • , Juh Yuh Su
  • , Wen Jeng Ho
  • , Meng Chyi Wu

Research output: Contribution to journalArticlepeer-review

8 Scopus citations

Abstract

We have designed and fabricated a high-reflectivity AlAs/GaAs distributed Bragg reflector (DBR) at 1.3 μm. By transplanting the InP/InGaAs/InP heterojunction epitaxial film to an AlAs/GaAs DBR, which is grown on the GaAs substrate, the epitaxial lift-off (ELO) photodiode exhibits a low dark current of 4.4 nA at a reverse bias of 0.5 V. This demonstrates the feasibility to fabricate a good performance of InGaAs/DBR resonant-cavity-enhanced photodetectors by ELO technique.

Original languageEnglish
Pages (from-to)1763-1767
Number of pages5
JournalSolid-State Electronics
Volume47
Issue number10
DOIs
StatePublished - Oct 2003

Bibliographical note

Funding Information:
The financial support from National Science Council (NSC 91-2215-E-007-013) and Photonic Technology Research, Telecommunication Laboratories, Chunghwa Telecom Company, Ltd., is appreciated.

Keywords

  • Distributed bragg reflector (DBR)
  • Epitaxial lift-off (ELO)
  • InGaAs p-i-n photodiode

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