DNA as an electron-beam-sensitive reagent for nanopatterning

A scheme for a DNA-based e-beam lithography technique that utilizes e-beam-induced oligonucleotide destruction was proposed. DNA molecules was used as an e-beam sensitive reagent, replacing e-beam resist in the process of e-beam lithography. DNA strands were allowed to carry nanoscale objects or chemical moieties for the construction of biosensors and molecular electronics. It was observed that the scanning electron microscopy (SEM) image displayed square patterns with brightness decreasing with exposure dose. DNA for patterning provided an alternative nanofabrication method, particularly for bio-related nanostructures. The e-beam exposure resulted in inhibition of hybridization of complementary strands. The method could be used with other noble metals and semiconductor colloidal nanoparticles. The technique also opened several opportunities for microlens and zone-plate fabrication, biosensor studies and nanodevice applications.