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Demonstration of high efficiency 19.68% MOS-structure silicon solar cell based on 20-nm TiO2 space layer at 4V biasing

  • Wen Jeng Ho
  • , Min Chun Huang
  • , Yi Yu Lee
  • , Zhong Fu Hou
  • , Jian Jyun Liao

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

The photovoltaic performance enhanced of a MOS-structure silicon solar cell with transparent-ITO/oxide-film and basing voltage on the ITO electrode is experimentally demonstrated. High transmittance (> 80%) and conductivity (> 4.637×107 μs/cm) of ITO film is obtained using a thermal sputtering deposition. The antireflective characteristics of ITO/TiO2 and ITO/SiO2 are simulated and characterized. Photovoltaic current-voltage, external quantum efficiency, and performance as a function of the biasing voltage are measured. The conversion efficiency increasing from 14.06% to 19.68% is obtained for the proposed MOS cell at 4 V biasing, compared to at 0 V one.

Original languageEnglish
Title of host publication2014 IEEE International Nanoelectronics Conference, INEC 2014
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781479950379
DOIs
StatePublished - 26 Apr 2016
EventIEEE International Nanoelectronics Conference, INEC 2014 - Sapporo, Japan
Duration: 28 Jul 201431 Jul 2014

Publication series

Name2014 IEEE International Nanoelectronics Conference, INEC 2014

Conference

ConferenceIEEE International Nanoelectronics Conference, INEC 2014
Country/TerritoryJapan
CitySapporo
Period28/07/1431/07/14

Bibliographical note

Publisher Copyright:
© 2014 IEEE.

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

  1. SDG 7 - Affordable and Clean Energy
    SDG 7 Affordable and Clean Energy

Keywords

  • ITO electrode
  • MOS-structure solar cell
  • conversion efficiency
  • photovoltaic
  • voltage biasing

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