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A nanorods AlN layer prepared by sputtering at oblique-angle and application as a buffer layer in a GaN-based light-emitting diodes

  • Lung Chien Chen
  • , Ching Ho Tien
  • , Shih Yi Chien
  • , Wei Chain Liao
  • , Chao Chong Huang
  • , Chien Sheng Mu
  • , Cheng Chiang Chen
  • , Ya Ying Hsu

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

We presents a nanorods AlN films on sapphire substrate deposited at oblique-angle by a radio-frequency reactive magnetron sputtering. A nanorods AlN layer was employed as a buffer layer for a GaN-based LEDs to improve optoelectronic characteristics of LEDs. The diameter of the nanorods AlN buffer layer is in the range of 30-50 nm. Typical current-voltage characteristics of the GaN-based LEDs with a nanorods AlN buffer layer have a forward-bias voltage of 3.1 V at an injection current of 20 mA. The output intensity of LEDs initially increases linearly as the injection current increases from 10 mA to 150 mA. The light output power of the GaN-based LED with a nanoporous AlN layer was about 31% higher than that of a GaN-based LED without a nanoporous AlN layer at an injection current of 250 mA.

Original languageEnglish
Title of host publicationTenth International Conference on Solid State Lighting
DOIs
StatePublished - 2010
Event10th International Conference on Solid State Lighting - San Diego, CA, United States
Duration: 2 Aug 20104 Aug 2010

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7784
ISSN (Print)0277-786X

Conference

Conference10th International Conference on Solid State Lighting
Country/TerritoryUnited States
CitySan Diego, CA
Period2/08/104/08/10

Keywords

  • GaN-based LED
  • Nanorods AlN layer
  • Oblique-angle

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